XD Series
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Pumping Speed
- 1,200 ~1,800 ㎥/hr
- 20,000 ~ 30,000 LPM
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Ultimate Pressure
- ≤ 5.0 x 10-3
- ≤ 6.6 x 10-1
As the semiconductor technology requirements are becoming more compact and complex, manipulation of wafer layers are becoming more precise and dynamic to control.
High-performing vacuum in vapor deposition steps will produce high-quality results such as in wafer surface analysis and property evaluation processes.
Dry vacuum pump is a key component in semiconductor technology.
XD Series
HD Series
DD Series